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Foreword ------- p.2

Minoru Matsumura

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Revision of New Glass Forum Managing System ------- p.3

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Feature Articles Planarized Multilevel Metallization for LSI

Dielectrics Applied for VLSI Planarized Multilevel Metallization ------- p.4

Katsuro Sugawara

Interlayer Dielectrics Technology by Using TEOS- based CVD ------- p.14

Hideo Kotani

Planarization Technology with Spin on glass Used in LSI ------- p.21

Nobuo Owada

Naofumi Ohashi

Si02 Film Formed by Using ECRPlasma CVD ------- p.28

Katsuyuki Machida

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New Glass Research Topics

Preparation of Mesoscopic Superionic Conductors by Rapid Quenching ------- p.34

Masahiro Tatsumisago

Tsutomu Minami

Development of Light Returnable Glass Bottles ------- p.40

Shuichi Yokokura

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Inside Topics in Development of

Synthesis of Diamond Film DIA-JET process ------- p.45

Kazuaki Kurihara

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Topics of Meetings on Glass

The 9th International Symposium on Non-Oxide Glasses ------- p.47

Yoji Kawamoto

The 3rd Sol-Gel Optics Meeting ------- p.48

Noboru Tohge

International Symposium on Non-Linear Photonics Materials ------- p.50

Naoki Sugimoto

The 6th joint MMM Intermag Conference ------- p.52

Toshihiro Kogure

The 7th Europhysical Conference on Defects in Insulating Materials ------- p.53

Junji Nishii

The 5th International Otto Schott Colloquium ------- p.55

Junji Nishii

The 55th Meeting on Applied Physics ------- p.56

Shin-ichi Todoroki

Spectral Hole Burning 1994 ------- p.57

Akio Makishima

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